Legal Informatics and Forensic Science InstituteHosts Joint Seminar with Utrecht University andHM Company

On Wednesday, November 1, 2023, the Institute for Digital Forensics and Law at Hallym University hosted a seminar titled "Law & Logic: Exploring Argumentation Technology in Legal Practice" in collaboration with Utrecht University and HM Company. The seminar featured a special lecture by the distinguished Professor Floris Bex from Utrecht University, Netherlands. His presentation, themed "Responsible AI for the Police of the Future," was followed by an engaging and insightful discussion session with the attendees. In a significant development, Hallym University's Legal Informatics and Forensic Science Institute also established a collaborative research agreement with the National Police Lab AI at Utrecht University. Since 2021, the Legal Informatics and Forensic Science Institute has been serving as the lead research and development institution for the "Technology Development Project for the Advancement of Scientific Criminal Investigation," under the auspices of the Korean National Police Agency. As part of this initiative, the institute is actively conducting the "Deep Case" project, which focuses on AI-based support for criminal investigations. Professor Ro-seop Park, who serves as both the Director of the Legal Informatics and Forensic Science Institute and the Dean of the College of Global Integrated Studies, organized the seminar. Reflecting on the event, he stated, "This seminar provided a valuable opportunity to present a clear direction for the application of AI natural language processing technology in scientific police investigations. We anticipate a bright future where continued research in this field will lead to practical applications in police work." Hallym University's Legal Informatics and Forensic Science Institute is primarily operated by graduate students pursuing master's and doctorate degrees, and it also welcomes the participation of undergraduate students with a keen interest in the field.